The Next Generation AGILE ALD Solutions for MEMS Manufacturing
The SALADIN (Superb Atomic LAyer Deposition tool for the semiconductor INdustry) project aims to take MEMS (MicroElectroMechanical Systems) manufacturing to a completely new level by combining the skills of three innovative, dynamic high tech and nanotechnology companies, all frontrunners in their own fields. Picosun Group (Finland), Silex Microsystems AB (Sweden), and Pegasus Chemicals Ltd (UK) collaborate in the SALADIN project to employ Atomic Layer Deposition (ALD) technology to realize emerging, advanced MEMS structures that would not be possible to manufacture by any other thin film deposition methods.
MEMS are crucial components in practically all our everyday electronics, and the rapidly spreading Internet-of-Things with its billions of independently communicating electronic devices will further accelerate the MEMS industry’s exponential growth in the near future.
ALD is already a mature, key enabling technology in conventional IC industries, and it is quickly breaking through in MEMS manufacturing as well. ALD’s innate ability to form the highest quality, uniform and conformal ultra-thin films on practically all surfaces and on the tiniest nanoscale details such as deep trenches, voids, cavities, and over high steps, makes it an ideal technology for MEMS industries. Furthermore, ALD process temperatures are modest, which saves the delicate MEMS structures from thermal stress that could have detrimental effect on their functionality.
The SALADIN project (funded from the European Union’s Horizon 2020 program, under project # 779 786) runs from November 2017 to the end of October 2021. The project is coordinated by Picosun Group.